IBM Research Demonstrates Path for Extending Current Chip-Making Technique

manufacturing method that usessoft-x-rays (also known as EUV, for extreme ultraviolet light) and exoticmirrors rather than laser light and lenses.

As part of its efforts to extend current optical lithography techniques,IBM developed an industry-leading interference immersion lithography testapparatus, called NEMO. IBM's NEMO tool uses two intersecting laser beamsto create light-and-dark interference patterns with spacings closer thancan be made with current chip-making apparatus. As a result, NEMO is idealfor researching, testing and optimizing the various high-index fluids andphotoresists being considered for use in those future DUV systems thatwould create such fine features. Now that IBM's new result shows a path forextending optical lithography, high-index lens materials must be developedto enable its commercial viability.

When light passes through a transparent material, it slows down inproportion to the material's "refractive index." Light passing through ahigher-index material has a shorter wavelength and can thus be focused moretightly. Resolution in immersion lithography is limited by the lowestrefractive index of the final lens, fluid and photoresist materials. InIBM's NEMO experiments, the lens and fluid had indices of about 1.6, andthe photoresist's index of refraction was 1.7. Future research is aimed atdeveloping lens, fluid and photoresist materials with indices of refractionof 1.9, which would enable even smaller features to be imaged.

About IBM Research:

IBM Research is the world's largest information technology researchorganization, with about 3,000 scientists and engineers in eight labs insix countries. IBM has produced more research breakthroughs than any othercompany in the IT industry. For more information on IBM Research, visit http://www.research.ibm.com.

For nearly three decades, IBM Research scientists in San Jose, California,have been leaders in the science and application of organic materials forelectronic applications. In the early 1980s, IBM Research scientists inSan Jose invented and developed the first chemically amplified photoresistmaterials, a high-speed resist that was first to solve the industry-wideproblem of low light intensity from deep ultraviolet mercury lamps.Chemical amplification is a revolutionary mechanism in which each photoncan generate acid-catalyst molecules that lead to a cascade of dozens tohundreds of solubility-switching events. Successive generations ofphotoresists employing this mechanism have been pioneered at IBM Almadenand used universally for 248- and 193-nanometer optical lithography.

For more information, contact:Michael RossIBM's Almaden Research Center408-927-1283(Mobile: 408-221-3359)mikeross@almaden.ibm.com

SOURCE:  IBM

Author:  

Email:    

Topic:    

Content:

Related Computer Hardware Articles

• IBM Unveils Versatile Multifunction Systems
  19 February 2006



• Brasil Telecom Taps IBM and Narus to Accurately Identify Revenue
  19 February 2006



• Media Advisory - City of Toronto, IBM Canada team up on community safety
  19 February 2006



• IBM to Launch Intellectual Property Podcast Series
  19 February 2006



• IBM Unveils Software to Help Clients Gain Insight, Take Action on Information
  19 February 2006



• Seven Summits Research Releases Comments on IBM, STX, ANF, MER, and ECA
  16 February 2006



• Restructuring to highlight H-P Report and IBM Shatters Computing Price Performance Barrier With New High Performance POWER5+(TM) Server
  16 February 2006



• Computech Resources, an IT Consulting Services Firm is Hosting a Technology Innovation Center Grand Opening - Featuring IBM, IDC Keynote Speakers
  15 February 2006



• GIPS VoiceEngine to Be Included in IBM Lotus Sametime Real-Time Collaboration Platform
  15 February 2006



• IBM Shatters Computing Price Performance Barrier With New High Performance POWER5+(TM) Server
  15 February 2006