Jordan Valley Semiconductors, Inc. Introduces Next-Generation, X-Ray Based Thin Film Metrology Platform

Jordan Valley Semiconductors, Inc. has announced the release of its JVX(TM) 6200 metrology tool platform. The new platform combines second generation fast X-ray Reflectivity (XRR), improved micro-spot X-ray Fluorescence (XRF), and industry leading Small Angle X-ray Scattering (SAXS). The new 6200 platform will deliver significant technological and business advantages to semiconductor manufacturers, according to Sean Jameson, Jordan Valley Vice President of Sales and Marketing. "The 6200 extends Jordan Valley's lead in x-ray based film measurement systems suitable for high volume production fabs," says Jameson. "The SAXS channel has the capability to measure the pore size and distribution in porous low-k films. The data has shown excellent correlation to PALS and minimum pore size detection down to sub-10 Angstrom diameter pores. Additionally, the system's improved speed, reliability and extendibility significantly reduce cost of ownership, which is of paramount importance in the industry today," he adds. The new Jordan Valley metrology platform features a smaller maintenance footprint, reduced preventative maintenance, higher throughput on XRR brightness and XRF flux, and new algorithm sophistication with a dual- processor CPU which enables true real-time processing. Combined, these features reduce total cost of ownership and provide a truly unique solution to high volume semiconductor manufacturers. The 6200 platform's technological innovations also include smaller spot size XRR and XRF, enhanced performance on high scatter samples and ultra-thin films (

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